Formation of excess donors during high-dose 74Ge+ Ion implantation

T. Tuomi, Z. Xia, E. Ristolainen, R. Elliman, H. Ronkainen, S. Eranen, P. Kuivalainen, M. Sopanen, P. Holloway

    Research output: Chapter in Book/Report/Conference proceedingChapterScientificpeer-review

    Original languageEnglish
    Title of host publicationMaterials Research Society symposia proceedings
    Publication statusPublished - 1995
    MoE publication typeA3 Book section, Chapters in research books

    Keywords

    • silicon-germanium, ion implantation

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