Formation of excess donors during high-dose 74Ge+ Ion implantation

T. Tuomi, Z. Xia, E. Ristolainen, R. Elliman, H. Ronkainen, S. Eranen, P. Kuivalainen, M. Sopanen, P. Holloway

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Scientific › peer-review

Original language	English
Title of host publication	Materials Research Society symposia proceedings
Publication status	Published - 1995
MoE publication type	A3 Part of a book or another research book

Keywords

@inbook{74c09b51b65e4586938f03478cc02161,

title = "Formation of excess donors during high-dose 74Ge+ Ion implantation",

keywords = "silicon-germanium, ion implantation, silicon-germanium, ion implantation, silicon-germanium, ion implantation",

author = "T. Tuomi and Z. Xia and E. Ristolainen and R. Elliman and H. Ronkainen and S. Eranen and P. Kuivalainen and M. Sopanen and P. Holloway",

year = "1995",

language = "English",

booktitle = "Materials Research Society symposia proceedings",

}

TY - CHAP

T1 - Formation of excess donors during high-dose 74Ge+ Ion implantation

AU - Tuomi, T.

AU - Xia, Z.

AU - Ristolainen, E.

AU - Elliman, R.

AU - Ronkainen, H.

AU - Eranen, S.

AU - Kuivalainen, P.

AU - Sopanen, M.

AU - Holloway, P.

PY - 1995

Y1 - 1995

KW - silicon-germanium, ion implantation

M3 - Chapter

BT - Materials Research Society symposia proceedings

ER -