Focused ion beam lithography for fabrication of suspended nanostructures on highly corrugated surfaces

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Focused ion beam lithography for fabrication of suspended nanostructures on highly corrugated surfaces. / Erdmanis, M.; Sievilä, P.; Shah, Syed; Chekurov, N.; Ovchinnikov, V.; Tittonen, I.

In: Nanotechnology, Vol. 25, No. 33, 335302, 22.08.2014.

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@article{ee5e4f15b83b4d9f9522b390407ff865,
title = "Focused ion beam lithography for fabrication of suspended nanostructures on highly corrugated surfaces",
abstract = "We propose a nanofabrication method that allows for patterning on extremely corrugated surfaces with micrometer-size features. The technique employs focused ion beam nanopatterning of ion-sensitive inorganic resists formed by atomic layer deposition at low temperature. The nanoscale resolution on corrugated surfaces is ensured by inherently large depth of focus of a focused ion beam system and very uniform resist coating. The utilized TiO2 and Al2O3 resists show high selectivity in deep reactive ion etching and enable the release of suspended nanostructures by dry etching. We demonstrate the great flexibility of the process by fabricating suspended nanostructures on flat surfaces, inclined walls, and on the bottom of deep grooves.",
keywords = "focused ion beam, nanofabrication, silicon",
author = "M. Erdmanis and P. Sievil{\"a} and Syed Shah and N. Chekurov and V. Ovchinnikov and I. Tittonen",
year = "2014",
month = "8",
day = "22",
doi = "10.1088/0957-4484/25/33/335302",
language = "English",
volume = "25",
journal = "Nanotechnology",
issn = "0957-4484",
number = "33",

}

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TY - JOUR

T1 - Focused ion beam lithography for fabrication of suspended nanostructures on highly corrugated surfaces

AU - Erdmanis, M.

AU - Sievilä, P.

AU - Shah, Syed

AU - Chekurov, N.

AU - Ovchinnikov, V.

AU - Tittonen, I.

PY - 2014/8/22

Y1 - 2014/8/22

N2 - We propose a nanofabrication method that allows for patterning on extremely corrugated surfaces with micrometer-size features. The technique employs focused ion beam nanopatterning of ion-sensitive inorganic resists formed by atomic layer deposition at low temperature. The nanoscale resolution on corrugated surfaces is ensured by inherently large depth of focus of a focused ion beam system and very uniform resist coating. The utilized TiO2 and Al2O3 resists show high selectivity in deep reactive ion etching and enable the release of suspended nanostructures by dry etching. We demonstrate the great flexibility of the process by fabricating suspended nanostructures on flat surfaces, inclined walls, and on the bottom of deep grooves.

AB - We propose a nanofabrication method that allows for patterning on extremely corrugated surfaces with micrometer-size features. The technique employs focused ion beam nanopatterning of ion-sensitive inorganic resists formed by atomic layer deposition at low temperature. The nanoscale resolution on corrugated surfaces is ensured by inherently large depth of focus of a focused ion beam system and very uniform resist coating. The utilized TiO2 and Al2O3 resists show high selectivity in deep reactive ion etching and enable the release of suspended nanostructures by dry etching. We demonstrate the great flexibility of the process by fabricating suspended nanostructures on flat surfaces, inclined walls, and on the bottom of deep grooves.

KW - focused ion beam

KW - nanofabrication

KW - silicon

UR - http://www.scopus.com/inward/record.url?scp=84905271022&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/25/33/335302

DO - 10.1088/0957-4484/25/33/335302

M3 - Article

VL - 25

JO - Nanotechnology

JF - Nanotechnology

SN - 0957-4484

IS - 33

M1 - 335302

ER -

ID: 9363636