Focused ion beam lithography for fabrication of suspended nanostructures on highly corrugated surfaces

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We propose a nanofabrication method that allows for patterning on extremely corrugated surfaces with micrometer-size features. The technique employs focused ion beam nanopatterning of ion-sensitive inorganic resists formed by atomic layer deposition at low temperature. The nanoscale resolution on corrugated surfaces is ensured by inherently large depth of focus of a focused ion beam system and very uniform resist coating. The utilized TiO2 and Al2O3 resists show high selectivity in deep reactive ion etching and enable the release of suspended nanostructures by dry etching. We demonstrate the great flexibility of the process by fabricating suspended nanostructures on flat surfaces, inclined walls, and on the bottom of deep grooves.


Original languageEnglish
Article number335302
Issue number33
Publication statusPublished - 22 Aug 2014
MoE publication typeA1 Journal article-refereed

    Research areas

  • focused ion beam, nanofabrication, silicon

ID: 9363636