Focused ion beam lithography for fabrication of suspended nanostructures on highly corrugated surfaces
Research output: Contribution to journal › Article
We propose a nanofabrication method that allows for patterning on extremely corrugated surfaces with micrometer-size features. The technique employs focused ion beam nanopatterning of ion-sensitive inorganic resists formed by atomic layer deposition at low temperature. The nanoscale resolution on corrugated surfaces is ensured by inherently large depth of focus of a focused ion beam system and very uniform resist coating. The utilized TiO2 and Al2O3 resists show high selectivity in deep reactive ion etching and enable the release of suspended nanostructures by dry etching. We demonstrate the great flexibility of the process by fabricating suspended nanostructures on flat surfaces, inclined walls, and on the bottom of deep grooves.
|Publication status||Published - 22 Aug 2014|
|MoE publication type||A1 Journal article-refereed|
- focused ion beam, nanofabrication, silicon