Original language | English |
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Pages (from-to) | 1-5 |
Journal | Applied Physics Letters |
Volume | 104 |
Issue number | 073118 |
DOIs | |
Publication status | Published - 2014 |
MoE publication type | A1 Journal article-refereed |
Focused ion beam high resolution grayscale lithography for silicon-based nanostructures
Mikhail Erdmanis, Ilkka Tittonen
Research output: Contribution to journal › Article › Scientific › peer-review
23
Citations
(Scopus)
285
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