Focused ion beam high resolution grayscale lithography for silicon-based nanostructures

Mikhail Erdmanis, Ilkka Tittonen

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@article{6b67f40ba3244737ba9b9dc19f69d923,

title = "Focused ion beam high resolution grayscale lithography for silicon-based nanostructures",

author = "Mikhail Erdmanis and Ilkka Tittonen",

year = "2014",

doi = "10.1063/1.4866586",

language = "English",

volume = "104",

pages = "1--5",

journal = "Applied Physics Letters",

issn = "0003-6951",

number = "073118",

}

TY - JOUR

T1 - Focused ion beam high resolution grayscale lithography for silicon-based nanostructures

AU - Erdmanis, Mikhail

AU - Tittonen, Ilkka

PY - 2014

Y1 - 2014

UR - http://scitation.aip.org/content/aip/journal/apl/104/7/10.1063/1.4866586

U2 - 10.1063/1.4866586

DO - 10.1063/1.4866586

M3 - Article

VL - 104

SP - 1

EP - 5

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 073118

ER -