First principles study of the atomic layer deposition of alumina by TMA/H2O-process

Timo Weckman, Kari Laasonen

    Research output: Contribution to journalArticleScientificpeer-review

    143 Downloads (Pure)
    Original languageEnglish
    Pages (from-to)17322-17334
    Number of pages13
    JournalPhysical Chemistry Chemical Physics
    Volume17
    Issue number26
    DOIs
    Publication statusPublished - 2015
    MoE publication typeA1 Journal article-refereed

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