Abstract
Control of detrimental metal impurities is crucial to silicon solar cell performance. Traditional silicon solar cell emitters are diffused in an infinite-source regime and are known to cause strong point defect segregation towards the emitter and thus enhance bulk minority carrier diffusion length. With the advent of ion-implantation and chemical vapor deposition (CVD) glasses, finite-source diffused emitters are attracting interest. This contribution aims to increase their adoption by elucidating the dominant gettering mechanisms present in finite-source diffused emitters. Our findings indicate that infinite-source diffusion is critical for effective segregation gettering, but that high enough surface phosphorus concentration can activate segregation gettering via finite-source diffusion as well. In the case of ion-implanted emitters, the traditional segregation gettering may be considerably enhanced by impurity precipitation in the implanted layer.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the 43rd IEEE Photovoltaic Specialists Conference (PVSC) |
| Publisher | IEEE |
| Pages | 678-680 |
| Number of pages | 3 |
| ISBN (Electronic) | 9781509027248 |
| DOIs | |
| Publication status | Published - 18 Nov 2016 |
| MoE publication type | A4 Conference publication |
| Event | IEEE Photovoltaic Specialists Conference - Portland, United States Duration: 5 Jun 2016 → 10 Jun 2016 Conference number: 43 |
Conference
| Conference | IEEE Photovoltaic Specialists Conference |
|---|---|
| Abbreviated title | PVSC |
| Country/Territory | United States |
| City | Portland |
| Period | 05/06/2016 → 10/06/2016 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
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