Fast dry fabrication process with ultra thin atomic layer deposited mask for released MEMS-devices with high electromechanical coupling

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review


Research units


Original languageEnglish
Title of host publicationTransducers'07 & Eurosensors XXI conference, Lyon, France, 10-14 June
Publication statusPublished - 2007
MoE publication typeA4 Article in a conference publication

    Research areas

  • atomic layer deposition, cryogenic etching, fabrication, micromechanics

ID: 7513844