@inproceedings{90c1a16959524fffa37eebf4f4c89cc4,
title = "Fast dry fabrication process with ultra thin atomic layer deposited mask for released MEMS-devices with high electromechanical coupling",
keywords = "atomic layer deposition, cryogenic etching, fabrication, micromechanics, atomic layer deposition, cryogenic etching, fabrication, micromechanics, atomic layer deposition, cryogenic etching, fabrication, micromechanics",
author = "Nikolai Chekurov and Mika Koskenvuori and Veli-Matti Airaksinen and Ilkka Tittonen",
year = "2007",
language = "English",
booktitle = "Transducers'07 & Eurosensors XXI conference, Lyon, France, 10-14 June",
}