Fast dry fabrication process with ultra thin atomic layer deposited mask for released MEMS-devices with high electromechanical coupling

Nikolai Chekurov, Mika Koskenvuori, Veli-Matti Airaksinen, Ilkka Tittonen

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

1 Citation (Scopus)
Original languageEnglish
Title of host publicationTransducers'07 & Eurosensors XXI conference, Lyon, France, 10-14 June
Publication statusPublished - 2007
MoE publication typeA4 Article in a conference publication

Keywords

  • atomic layer deposition
  • cryogenic etching
  • fabrication
  • micromechanics

Cite this

Chekurov, N., Koskenvuori, M., Airaksinen, V-M., & Tittonen, I. (2007). Fast dry fabrication process with ultra thin atomic layer deposited mask for released MEMS-devices with high electromechanical coupling. In Transducers'07 & Eurosensors XXI conference, Lyon, France, 10-14 June