@techreport{1c69ebb0e8644000843007e1656ebe45,
title = "Fabrication of ultrathin Silicon Dioxide Layers in Ultrahigh Vacuum",
keywords = "Plasma Oxidation, Silicon Dioxide, Ultrahigh Vacuum, Plasma Oxidation, Silicon Dioxide, Ultrahigh Vacuum, Plasma Oxidation, Silicon Dioxide, Ultrahigh Vacuum",
author = "T. Majamaa and V-M. Airaksinen and J. Sinkkonen",
year = "1995",
language = "English",
series = "The Third International Symposium on Atomically controlled Surfaces and Interfaces, Raleigh, North Carolina 12.-14.10.1995",
publisher = "North Carolina State University, College of Physical and Mathematical Sciences",
type = "WorkingPaper",
institution = "North Carolina State University, College of Physical and Mathematical Sciences",
}