Fabrication of ultrathin Silicon Dioxide Layers in Ultrahigh Vacuum

T. Majamaa, V-M. Airaksinen, J. Sinkkonen

Research output: Working paperProfessional

8 Citations (Scopus)
Original languageEnglish
Place of PublicationRaleigh, NC
Publication statusPublished - 1995
MoE publication typeD4 Published development or research report or study

Publication series

NameThe Third International Symposium on Atomically controlled Surfaces and Interfaces, Raleigh, North Carolina 12.-14.10.1995
PublisherNorth Carolina State University, College of Physical and Mathematical Sciences

Keywords

  • Plasma Oxidation
  • Silicon Dioxide
  • Ultrahigh Vacuum

Cite this

Majamaa, T., Airaksinen, V-M., & Sinkkonen, J. (1995). Fabrication of ultrathin Silicon Dioxide Layers in Ultrahigh Vacuum. (The Third International Symposium on Atomically controlled Surfaces and Interfaces, Raleigh, North Carolina 12.-14.10.1995).