Fabrication of Ultrathin Silicon Dioxide Layers in Ultra High Vacuum

T. Majamaa, V-M. Airaksinen, J. Sinkkonen

Research output: Contribution to journalArticleScientificpeer-review

8 Citations (Scopus)
Original languageEnglish
Pages (from-to)172-177
JournalApplied Surface Science
Volume107
Issue numberNov. II
Publication statusPublished - 1996
MoE publication typeA1 Journal article-refereed

Keywords

  • plasma oxidation
  • ultra high vacuum
  • ultrathin silicon dioxide

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