Fabrication of sub-100nm GaAs/AlGaAs-columns using reactive ion etching

J. Ahopelto, E. Siren, V.-M. Airaksinen, H. Niemi

Research output: Working paperProfessional

Original languageEnglish
Place of PublicationHelsinki
Publication statusPublished - 1994
MoE publication typeD4 Published development or research report or study

Publication series

NameXXVIII Annual Conference of the Finnish Physical Society
PublisherThe Finnish Physical Society


  • GaAs/AlGaAs
  • reactive ion etching

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