Fabrication of SOI micro- and nanoelectromechanical devices by focused ion beam doping and deep reactive ion etching

Nikolai Chekurov, Lauri Sainiemi, Antti Peltonen, Ilkka Tittonen, Sami Franssila

Research output: Working paper › Professional

Original language	English
Publication status	Published - 2009
MoE publication type	D4 Published development or research report or study

Name	Micro and Nanoengineering, Ghent, 2009

Cite this

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title = "Fabrication of SOI micro- and nanoelectromechanical devices by focused ion beam doping and deep reactive ion etching",

author = "Nikolai Chekurov and Lauri Sainiemi and Antti Peltonen and Ilkka Tittonen and Sami Franssila",

year = "2009",

language = "English",

series = "Micro and Nanoengineering, Ghent, 2009",

type = "WorkingPaper",

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T1 - Fabrication of SOI micro- and nanoelectromechanical devices by focused ion beam doping and deep reactive ion etching

AU - Chekurov, Nikolai

AU - Sainiemi, Lauri

AU - Peltonen, Antti

AU - Tittonen, Ilkka

AU - Franssila, Sami

PY - 2009

Y1 - 2009

M3 - Working paper

T3 - Micro and Nanoengineering, Ghent, 2009

BT - Fabrication of SOI micro- and nanoelectromechanical devices by focused ion beam doping and deep reactive ion etching

ER -