Fabrication and characterization of small tunnel junctions through a thin dielectric membrane

A. Aassime*, A. J. Manninen, J. P. Pekola

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)

Abstract

We show that a small tapered hole through a thin silicon nitride membrane provides a mask for tunnel junction structures. Our experiments imply, unlike in the conventional planar electron beam lithography, that tunnel junctions are well voltage biased in this structure with vanishingly small on-chip impedance. Our technique allows fabrication of double junctions, and even multijunction linear arrays, with small metallic islands in between.

Original languageEnglish
Pages (from-to)2369-2371
Number of pages3
JournalApplied Physics Letters
Volume73
Issue number16
DOIs
Publication statusPublished - 1998
MoE publication typeA1 Journal article-refereed

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