Exploiting volatile lead compounds as precursors for the atomic layer deposition of lead dioxide thin films

Jenni Harjuoja; Matti Putkonen; Lauri Niinistö

Exploiting volatile lead compounds as precursors for the atomic layer deposition of lead dioxide thin films

Jenni Harjuoja, Matti Putkonen, Lauri Niinistö

Research output: Contribution to journal › Article › Scientific › peer-review

13 Citations (Scopus)

Original language	English
Pages (from-to)	77-82
Journal	Thin Solid Films
Volume	497
Issue number	1-2
Publication status	Published - 2006
MoE publication type	A1 Journal article-refereed

Keywords

Lead dioxide, Atomic Layer Deposition, ALD, Surface morphology

Cite this

@article{1686a60e82ca4c0e9aeb325228bfbe11,

title = "Exploiting volatile lead compounds as precursors for the atomic layer deposition of lead dioxide thin films",

keywords = "Lead dioxide, Atomic Layer Deposition, ALD, Surface morphology, Lead dioxide, Atomic Layer Deposition, ALD, Surface morphology, Lead dioxide, Atomic Layer Deposition, ALD, Surface morphology",

author = "Jenni Harjuoja and Matti Putkonen and Lauri Niinist{\"o}",

year = "2006",

language = "English",

volume = "497",

pages = "77--82",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "1-2",

}

TY - JOUR

T1 - Exploiting volatile lead compounds as precursors for the atomic layer deposition of lead dioxide thin films

AU - Harjuoja, Jenni

AU - Putkonen, Matti

AU - Niinistö, Lauri

PY - 2006

Y1 - 2006

KW - Lead dioxide, Atomic Layer Deposition, ALD, Surface morphology

M3 - Article

SN - 0040-6090

VL - 497

SP - 77

EP - 82

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-2

ER -