Excellent silicon surface passivation using dimethylaluminium chloride as Al source for atomic layer deposited Al2O3

S. Li, Yameng Bao, M. Laitinen, T. Sajavaara, M. Putkonen, Hele Savin

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Pages (from-to)1795-1799
Number of pages5
JournalPHYSICA STATUS SOLIDI A: APPLICATIONS AND MATERIALS SCIENCE
Volume212
Issue number8
DOIs
Publication statusPublished - 2015
MoE publication typeA1 Journal article-refereed

Equipment

OtaNano

Anna Rissanen (Manager)

Aalto University

Facility/equipment: Facility

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