Evolution of surface roughness in KOH etching of silicon caused by material defects

Eero Haimi, Veikko Lindroos

    Research output: Contribution to journalArticleScientificpeer-review

    3 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)37-42
    JournalSensors and Materials
    Volume15
    Issue number1
    Publication statusPublished - 2003
    MoE publication typeA1 Journal article-refereed

    Keywords

    • KOH etching
    • material defects
    • silicon
    • surface roughness

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