Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
- Karsten Arts
- , J. H. Deijkers
- , T. Faraz
- , Riikka Puurunen
- , Wilhelmus M.M. (Erwin) Kessels*
- , Harm C. M. Knoops
*Corresponding author for this work
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