Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate

Karsten Arts, J. H. Deijkers, T. Faraz, Riikka Puurunen, Wilhelmus M.M. (Erwin) Kessels*, Harm C. M. Knoops

*Corresponding author for this work

Research output: Contribution to journal › Article › Scientific › peer-review

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