Evaluation of critical thickness of GaP0.98N0.02 layer on GaP substrate by synchrotron X-ray diffraction topography

Research output: Contribution to journalArticleScientificpeer-review

Researchers

Research units

  • University of Hamburg

Details

Original languageEnglish
Pages (from-to)680-684
Number of pages5
JournalThin Solid Films
Volume534
Publication statusPublished - 1 May 2013
MoE publication typeA1 Journal article-refereed

ID: 961543