Erratum: Random deposition as a growth mode in atomic layer deposition (Chemical Vapor Deposition (2004) 10 (159))

Research output: Contribution to journal › Comment/debate › Scientific › peer-review

Original language	English
Pages (from-to)	234
Number of pages	1
Journal	Chemical Vapor Deposition
Volume	11
Issue number	5
DOIs	https://doi.org/10.1002/cvde.200590011
Publication status	Published - May 2005
MoE publication type	B1 Non-refereed journal articles

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title = "Erratum: Random deposition as a growth mode in atomic layer deposition (Chemical Vapor Deposition (2004) 10 (159))",

author = "Puurunen, {Riikka L.}",

year = "2005",

month = may,

doi = "10.1002/cvde.200590011",

language = "English",

volume = "11",

pages = "234",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

number = "5",

}

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T2 - Random deposition as a growth mode in atomic layer deposition (Chemical Vapor Deposition (2004) 10 (159))

AU - Puurunen, Riikka L.

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U2 - 10.1002/cvde.200590011

DO - 10.1002/cvde.200590011

M3 - Comment/debate

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