Enhanced growth rate in atomic layer epitaxy deposition of magnesium oxide thin films

M. Putkonen, T. Sajavaara, L. Niinistö

Research output: Contribution to journal › Article › Scientific › peer-review

68 Citations (Scopus)

Original language	English
Pages (from-to)	1857-1861
Journal	Journal of Materials Chemistry
Volume	10
Issue number	8
Publication status	Published - 2000
MoE publication type	A1 Journal article-refereed

Keywords

@article{4f02a4caf06e436f817a245928aa501e,

title = "Enhanced growth rate in atomic layer epitaxy deposition of magnesium oxide thin films",

keywords = "atomic layer epitaxy, organometallic, atomic layer epitaxy, organometallic, atomic layer epitaxy, organometallic",

author = "M. Putkonen and T. Sajavaara and L. Niinist{\"o}",

year = "2000",

language = "English",

volume = "10",

pages = "1857--1861",

journal = "Journal of Materials Chemistry",

issn = "0959-9428",

number = "8",

}

TY - JOUR

T1 - Enhanced growth rate in atomic layer epitaxy deposition of magnesium oxide thin films

AU - Putkonen, M.

AU - Sajavaara, T.

AU - Niinistö, L.

PY - 2000

Y1 - 2000

KW - atomic layer epitaxy

KW - organometallic

KW - atomic layer epitaxy

KW - organometallic

KW - atomic layer epitaxy

KW - organometallic

M3 - Article

VL - 10

SP - 1857

EP - 1861

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

SN - 0959-9428

IS - 8

ER -