Effects of Various Pre-Intrinsic and Phosphorus Diffusion Gettering Effects Upon Quality of Czochralski Silicon Wafer Surface during a Simulated 4 Megabit Dynamic Random Acces Memory Process

J. Partanen, T. Tuomi, D-Y. Yang, H.G. Lee, O.H. Kim, S. Hahn

    Research output: Contribution to journalArticleScientificpeer-review

    Original languageEnglish
    Pages (from-to)1431-1437
    JournalJournal of the Electrochemical Society
    Volume139
    Publication statusPublished - 1992
    MoE publication typeA1 Journal article-refereed

    Keywords

    • gettering
    • silicon processing
    • synchrotron radiation

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