Effects of heat-treatment of silica and precursor on the surface density of aminosilanes onto silica by atomic layer deposition

Satu Ek, Eero Iiskola, Lauri Niinistö

    Research output: Working paperProfessional

    Original languageEnglish
    Publication statusPublished - 2003
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameChemical Vapor Deposition XVI and EUROCVD 14, Paris, 2003

    Keywords

    • ALD
    • atomic layer deposition
    • porous silicon

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