Effect of the misorientation of the 4H-SiC substrate on the open volume defects in GaN grown by metal organic chemical vapour deposition

E. Tengborn, M. Rummukainen, F. Tuomisto, K. Saarinen, M. Rudzinski, P.R. Hageman, P.K. Larsen, A. Nordlund

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)
249 Downloads (Pure)

Abstract

Positron annihilation spectroscopy has been used to study GaN grown by metal-organic chemical vapor deposition on misoriented 4H-SiC substrates. Two kinds of vacancy defects are observed: Ga vacancies and larger vacancy clusters in all the studied layers. In addition to vacancies, positrons annihilate at shallow traps that are likely to be dislocations. The results show that the vacancy concentration increases and the shallow positron trap concentration decreases with the increasing substrate misorientation.
Original languageEnglish
Article number091905
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume89
Issue number9
DOIs
Publication statusPublished - 2006
MoE publication typeA1 Journal article-refereed

Keywords

  • annihilation
  • GaN
  • misoriented
  • positron
  • vacancy

Fingerprint

Dive into the research topics of 'Effect of the misorientation of the 4H-SiC substrate on the open volume defects in GaN grown by metal organic chemical vapour deposition'. Together they form a unique fingerprint.

Cite this