Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

H Seppanen^*, I Prozheev, C Kauppinen, S Suihkonen, K Mizohata, H Lipsanen

^*Corresponding author for this work

Research output: Contribution to journal › Article › Scientific › peer-review

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Finished
PREIN: Photonics Research and Innovation
Mäkelä, K. (Principal investigator)
01/01/2019 → 31/12/2022
Project: Academy of Finland: Other research funding