Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

H Seppanen^*, I Prozheev, C Kauppinen, S Suihkonen, K Mizohata, H Lipsanen

^*Corresponding author for this work

Research output: Contribution to journal › Article › Scientific › peer-review

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Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon
Sopanen, M.
11/08/2023
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