Dry fabrication of microdevices by the combination of focused ion beam and cryogenic deep reactive ion etching

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Original languageEnglish
Pages (from-to)085009
JournalJournal of Micromechanics and Microengineering
Volume20
Issue number8
Publication statusPublished - 2010
MoE publication typeA1 Journal article-refereed

    Research areas

  • DRIE, FIB, MEMS

ID: 740524