Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer

Mikko I. Laitinen; T. Sajavaara; M. Rossi; J. Julin; R. L. Puurunen; T. Suni; T. Ishida; H. Fujita; K. Arstila; B. Brijs; H. J. Whitlow

doi:10.1016/j.nimb.2011.04.074

Depth profiling of Al₂O₃ + TiO₂ nanolaminates by means of a time-of-flight energy spectrometer

Mikko I. Laitinen^*, T. Sajavaara, M. Rossi, J. Julin, R. L. Puurunen, T. Suni, T. Ishida, H. Fujita, K. Arstila, B. Brijs, H. J. Whitlow

^*Corresponding author for this work

Not published at Aalto University

Research output: Contribution to journal › Article › Scientific › peer-review

13 Citations (Scopus)

Abstract

Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a sub-nm thickness control. By using ALD for nanolaminate oxides, it is possible to fine tune the electrical, optical and mechanical properties of thin films. In this study the elemental depth profiles and surface roughnesses were determined for Al₂O₃ + TiO₂ nanolaminates with nominal single-layer thicknesses of 1, 2, 5, 10 and 20 nm and total thickness between 40 nm and 60 nm. The depth profiles were measured by means of a time-of-flight elastic recoil detection analysis (ToF-ERDA) spectrometer recently installed at the University of Jyväskylä. In TOF-E measurements ⁶³Cu, ³⁵Cl, ¹²C and ⁴He ions with energies ranging from 0.5 to 10 MeV, were used and depth profiles of the whole nanolaminate film could be analyzed down to 5 nm individual layer thickness.

Original language	English
Pages (from-to)	3021-3024
Number of pages	4
Journal	NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Volume	269
Issue number	24
DOIs	https://doi.org/10.1016/j.nimb.2011.04.074
Publication status	Published - 15 Dec 2011
MoE publication type	A1 Journal article-refereed

Keywords

AlO and TiO
ALD
Depth profiling
ERD
Nanolaminate
ToF-ERDA

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Laitinen, M. I., Sajavaara, T., Rossi, M., Julin, J., Puurunen, R. L., Suni, T., Ishida, T., Fujita, H., Arstila, K., Brijs, B., & Whitlow, H. J. (2011). Depth profiling of Al₂O₃ + TiO₂ nanolaminates by means of a time-of-flight energy spectrometer. NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 269(24), 3021-3024. https://doi.org/10.1016/j.nimb.2011.04.074

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abstract = "Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a sub-nm thickness control. By using ALD for nanolaminate oxides, it is possible to fine tune the electrical, optical and mechanical properties of thin films. In this study the elemental depth profiles and surface roughnesses were determined for Al2O3 + TiO2 nanolaminates with nominal single-layer thicknesses of 1, 2, 5, 10 and 20 nm and total thickness between 40 nm and 60 nm. The depth profiles were measured by means of a time-of-flight elastic recoil detection analysis (ToF-ERDA) spectrometer recently installed at the University of Jyv{\"a}skyl{\"a}. In TOF-E measurements 63Cu, 35Cl, 12C and 4He ions with energies ranging from 0.5 to 10 MeV, were used and depth profiles of the whole nanolaminate film could be analyzed down to 5 nm individual layer thickness.",

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author = "Laitinen, {Mikko I.} and T. Sajavaara and M. Rossi and J. Julin and Puurunen, {R. L.} and T. Suni and T. Ishida and H. Fujita and K. Arstila and B. Brijs and Whitlow, {H. J.}",

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Laitinen, MI, Sajavaara, T, Rossi, M, Julin, J, Puurunen, RL, Suni, T, Ishida, T, Fujita, H, Arstila, K, Brijs, B & Whitlow, HJ 2011, 'Depth profiling of Al₂O₃ + TiO₂ nanolaminates by means of a time-of-flight energy spectrometer', NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, vol. 269, no. 24, pp. 3021-3024. https://doi.org/10.1016/j.nimb.2011.04.074

Depth profiling of Al₂O₃ + TiO₂ nanolaminates by means of a time-of-flight energy spectrometer. / Laitinen, Mikko I.; Sajavaara, T.; Rossi, M. et al.

In: NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol. 269, No. 24, 15.12.2011, p. 3021-3024.

Research output: Contribution to journal › Article › Scientific › peer-review

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AU - Julin, J.

AU - Puurunen, R. L.

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AU - Ishida, T.

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AU - Whitlow, H. J.

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