Depth and profile control in plasma etched MEMS structures

J. Kiihamäki, H. Kattelus, S. Franssila

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Original languageEnglish
Title of host publicationTransducers'99, Sendai, Japan, June 7-10, 1999
Pagespaper 3A1.3
Publication statusPublished - 1999
MoE publication typeA4 Article in a conference publication

Keywords

  • ARDE
  • ICP
  • silicon

Cite this

Kiihamäki, J., Kattelus, H., & Franssila, S. (1999). Depth and profile control in plasma etched MEMS structures. In Transducers'99, Sendai, Japan, June 7-10, 1999 (pp. paper 3A1.3)