Depth and profile control in plasma etched MEMS structures

J. Kiihamäki, H. Kattelus, J. Karttunen, S. Franssila

Research output: Contribution to journalArticleScientificpeer-review

23 Citations (Scopus)
Original languageEnglish
Pages (from-to)234-238
JournalSensors and Actuators
Volume82
Publication statusPublished - 2000
MoE publication typeA1 Journal article-refereed

Keywords

  • ARDE
  • etching
  • ICP
  • loading
  • plasma
  • RIE-lag.
  • silicon

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