Deposition of tin oxide into porous silicon by atomic layer epitaxy

C. Ducsö, N. Khanh, Z. Horvath, I. Barsony, M. Utriainen, S. Lehto, M. Nieminen, L. Niinistö

    Research output: Contribution to journalArticleScientificpeer-review

    63 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)683-687
    JournalJournal of the Electrochemical Society
    Volume143
    Publication statusPublished - 1996
    MoE publication typeA1 Journal article-refereed

    Keywords

    • atomic layer epitaxy
    • rbs
    • sims
    • tem
    • tin oxide

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