Deposition of LaNiO3 thin films in an atomic layer epitaxy reactor

H. Seim; H. Mölsä; M. Nieminen; H. Fjellvåg; L. Niinistö

Deposition of LaNiO3 thin films in an atomic layer epitaxy reactor

H. Seim, H. Mölsä, M. Nieminen, H. Fjellvåg, L. Niinistö

Research output: Contribution to journal › Article › Scientific › peer-review

62 Citations (Scopus)

Original language	English
Pages (from-to)	449-454
Journal	Journal of Materials Chemistry
Volume	7
Publication status	Published - 1997
MoE publication type	A1 Journal article-refereed

Keywords

ale
atomic layer epitaxy
lathanum
nickel
oxide
thin film

Cite this

@article{0a2f798def75433e951d2aa192523d20,

title = "Deposition of LaNiO3 thin films in an atomic layer epitaxy reactor",

keywords = "ale, atomic layer epitaxy, lathanum, nickel, oxide, thin film, ale, atomic layer epitaxy, lathanum, nickel, oxide, thin film, ale, atomic layer epitaxy, lathanum, nickel, oxide, thin film",

author = "H. Seim and H. M{\"o}ls{\"a} and M. Nieminen and H. Fjellv{\aa}g and L. Niinist{\"o}",

year = "1997",

language = "English",

volume = "7",

pages = "449--454",

journal = "Journal of Materials Chemistry",

issn = "0959-9428",

}

TY - JOUR

T1 - Deposition of LaNiO3 thin films in an atomic layer epitaxy reactor

AU - Seim, H.

AU - Mölsä, H.

AU - Nieminen, M.

AU - Fjellvåg, H.

AU - Niinistö, L.

PY - 1997

Y1 - 1997

KW - ale

KW - atomic layer epitaxy

KW - lathanum

KW - nickel

KW - oxide

KW - thin film

KW - ale

KW - atomic layer epitaxy

KW - lathanum

KW - nickel

KW - oxide

KW - thin film

KW - ale

KW - atomic layer epitaxy

KW - lathanum

KW - nickel

KW - oxide

KW - thin film

M3 - Article

VL - 7

SP - 449

EP - 454

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

SN - 0959-9428

ER -