Deposition of LaNiO3 thin films in an atomic layer epitaxy reactor

H. Seim, H. Mölsä, M. Nieminen, H. Fjellvåg, L. Niinistö

    Research output: Contribution to journalArticleScientificpeer-review

    62 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)449-454
    JournalJournal of Materials Chemistry
    Volume7
    Publication statusPublished - 1997
    MoE publication typeA1 Journal article-refereed

    Keywords

    • ale
    • atomic layer epitaxy
    • lathanum
    • nickel
    • oxide
    • thin film

    Cite this