Deposition of cerium dioxide thin films on silicon substrates by atomic layer epitaxy

H. Mölsä, L. Niinistö

    Research output: Chapter in Book/Report/Conference proceedingChapterScientificpeer-review

    30 Citations (Scopus)
    Original languageEnglish
    Title of host publicationMater.Res.Soc.Symp.Proc.Vol. 335, Metal-organic chemical vapor deposition of electronic ceramics
    EditorsS.B. Desu, D.B. Beach, B.W. Wessels, S. Gokoglu
    Place of PublicationPittsburgh, Pennsylvania, USA
    PublisherMaterial Research Society
    Pages341-350
    Publication statusPublished - 1994
    MoE publication typeA3 Part of a book or another research book

    Keywords

    • atomic layer epitaxy
    • cerium dioxide
    • silicon substrate
    • thin film

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