Deep silicon etching in inductively coupled plasma reactor for MEMS

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{ab3e3732a781414796b37b4898a64fad,

title = "Deep silicon etching in inductively coupled plasma reactor for MEMS",

keywords = "ARDE, feature size, ICP, ARDE, feature size, ICP, ARDE, feature size, ICP",

author = "J. Kiiham{\"a}ki and Sami Franssila",

year = "1999",

language = "English",

volume = "T79",

pages = "250--254",

journal = "Physica Scripta ",

issn = "0031-8949",

publisher = "IOP Publishing Ltd.",

number = "T79",

}