Deep silicon etching in inductively coupled plasma reactor for MEMS

J. Kiihamäki, Sami Franssila

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Pages (from-to)250-254
JournalPhysica Scripta
VolumeT79
Issue numberT79
Publication statusPublished - 1999
MoE publication typeA1 Journal article-refereed

Keywords

  • ARDE
  • feature size
  • ICP

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