Deep Reactive Ion Etching

Franz Lärmer; Sami Franssila; Lauri Sainiemi; Kai Kolari

doi:10.1016/B978-0-323-29965-7.00021-X

Deep Reactive Ion Etching

Franz Lärmer, Sami Franssila, Lauri Sainiemi, Kai Kolari

Department of Chemistry and Materials Science

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Scientific › peer-review

20 Citations (Scopus)

Original language	English
Title of host publication	Handbook of silicon based MEMS materials and technologies, 2nd edition
Editors	Sami Franssila, Markku Tilli, Veikko Lindroos, Teruaki Motooka, Veli-Matti Airaksinen, Mervi Paulasto-Krockel
Place of Publication	Lontoo
Publisher	Elsevier
Pages	444-469
ISBN (Electronic)	978-0-08-094772-3
ISBN (Print)	978-0-323-29965-7
DOIs	https://doi.org/10.1016/B978-0-323-29965-7.00021-X
Publication status	Published - 2015
MoE publication type	A3 Part of a book or another research book

Access to Document

10.1016/B978-0-323-29965-7.00021-X

Raw Materials Research Infrastructure
Maarit Karppinen (Manager)
School of Chemical Engineering
Facility/equipment: Facility

Cite this

@inbook{22ac6b2f011f41f3b4e2913016fae487,

title = "Deep Reactive Ion Etching",

author = "Franz L{\"a}rmer and Sami Franssila and Lauri Sainiemi and Kai Kolari",

year = "2015",

doi = "10.1016/B978-0-323-29965-7.00021-X",

language = "English",

isbn = "978-0-323-29965-7",

pages = "444--469",

editor = "Sami Franssila and Markku Tilli and Veikko Lindroos and Teruaki Motooka and Veli-Matti Airaksinen and Mervi Paulasto-Krockel",

booktitle = "Handbook of silicon based MEMS materials and technologies, 2nd edition",

publisher = "Elsevier",

address = "Netherlands",

}

Deep Reactive Ion Etching. / Lärmer, Franz; Franssila, Sami; Sainiemi, Lauri; Kolari, Kai.

Handbook of silicon based MEMS materials and technologies, 2nd edition. ed. / Sami Franssila; Markku Tilli; Veikko Lindroos; Teruaki Motooka; Veli-Matti Airaksinen; Mervi Paulasto-Krockel. Lontoo : Elsevier, 2015. p. 444-469.

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Scientific › peer-review

TY - CHAP

T1 - Deep Reactive Ion Etching

AU - Lärmer, Franz

AU - Franssila, Sami

AU - Sainiemi, Lauri

AU - Kolari, Kai

PY - 2015

Y1 - 2015

U2 - 10.1016/B978-0-323-29965-7.00021-X

DO - 10.1016/B978-0-323-29965-7.00021-X

M3 - Chapter

SN - 978-0-323-29965-7

SP - 444

EP - 469

BT - Handbook of silicon based MEMS materials and technologies, 2nd edition

A2 - Franssila, Sami

A2 - Tilli, Markku

A2 - Lindroos, Veikko

A2 - Motooka, Teruaki

A2 - Airaksinen, Veli-Matti

A2 - Paulasto-Krockel, Mervi

PB - Elsevier

CY - Lontoo

ER -

Deep Reactive Ion Etching

Access to Document

Raw Materials Research Infrastructure

Cite this