Decreasing Interface Defect Densities via Silicon Oxide Passivation at Temperatures Below 450 C

Zahra Jahanshah Rad, Juha-Pekka Lehtiö, Iris Mack, Kawa Rosta, Kexun Chen, Ville Vähänissi, Marko P.J. Punkkinen, Risto Punkkinen, Hannu-Pekka Hedman, Andrei Pavlov, Mikhail V. Kuzmin, Hele Savin, Pekka J. Laukkanen, Kalevi Kokko

Electron Physics Group (EPG)
Department of Electronics and Nanoengineering

University of Turku
Ioffe Physical Technical Institute

Research output: Contribution to journal › Article › Scientific › peer-review

5 Citations (Scopus)

71 Downloads (Pure)

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Finished
-: Photonics Research and Innovation
Savin, H., Ayedh, H., Mulbagal Rajanna, P., Rauha, I., Liu, H. & Vähänissi, V.
01/01/2019 → 31/12/2022
Project: Academy of Finland: Other research funding
SISUPROCO: Silicon Surface Processing Commercialization
Savin, H., Rosta, K., Vähänissi, V. & Mack, I.
01/06/2018 → 31/12/2019
Project: Business Finland: Other research funding

Decreasing Interface Defect Densities via Silicon Oxide Passivation at Temperatures Below 450 C

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Search results

-: Photonics Research and Innovation

SISUPROCO: Silicon Surface Processing Commercialization