Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films

L. B. Wang; O-P Saira; D. S. Golubev; J. P. Pekola

doi:10.1103/PhysRevApplied.12.024051

Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films

L. B. Wang^*, O-P Saira, D. S. Golubev, J. P. Pekola

^*Corresponding author for this work

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Abstract

We observe a crossover fromelectron-phonon (e-ph) coupling limited energy relaxation to that governed by thermal boundary resistance (phonon-phonon coupling, ph-ph) in copper films at subkelvin temperatures. Our measurement yields a quantitative picture of heat currents, in terms of temperature dependences and magnitudes, in both e-ph and pp limited regimes, respectively. We show that by adding a third layer in between the copper film and the substrate, the thermal boundary resistance is increased fourfold, consistent with an assumed series connection of thermal resistances.

Original language	English
Article number	024051
Pages (from-to)	1-6
Number of pages	6
Journal	Physical Review Applied
Volume	12
Issue number	2
DOIs	https://doi.org/10.1103/PhysRevApplied.12.024051
Publication status	Published - 23 Aug 2019
MoE publication type	A1 Journal article-refereed

Keywords

HEAT-CONDUCTION
HOT-ELECTRONS
QUANTUM
MULTILAYERS

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10.1103/PhysRevApplied.12.024051

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SQH: Superconducting quantum heat engines and refrigerators
Pekola, J., Karimi, B., Singh, S., Blanchet, F., Peltonen, J., Subero Rengel, D., Upadhyay, R., Gubaydullin, A., Wang, L., Chang, Y., Mäkinen, I., Marín Suárez, M., Thomas, G., Lvov, D., Mannila, E., Senior, J., Strelnikov, A., Chiang, K., Lemziakov, S., Satrya, C., Chen, Z. & Serrati, E.
27/09/2017 → 30/09/2023
Project: EU: ERC grants
QTF: Finnish Centre of Excellence in Quantum Technology
Pekola, J., Blanchet, F., Golubev, D., Maillet, O., Marín Suárez, M., Mannila, E. & Senior, J.
01/01/2018 → 31/12/2020
Project: Academy of Finland: Other research funding

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Cite this

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title = "Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films",

abstract = "We observe a crossover fromelectron-phonon (e-ph) coupling limited energy relaxation to that governed by thermal boundary resistance (phonon-phonon coupling, ph-ph) in copper films at subkelvin temperatures. Our measurement yields a quantitative picture of heat currents, in terms of temperature dependences and magnitudes, in both e-ph and pp limited regimes, respectively. We show that by adding a third layer in between the copper film and the substrate, the thermal boundary resistance is increased fourfold, consistent with an assumed series connection of thermal resistances.",

keywords = "HEAT-CONDUCTION, HOT-ELECTRONS, QUANTUM, MULTILAYERS",

author = "Wang, {L. B.} and O-P Saira and Golubev, {D. S.} and Pekola, {J. P.}",

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AU - Saira, O-P

AU - Golubev, D. S.

AU - Pekola, J. P.

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AB - We observe a crossover fromelectron-phonon (e-ph) coupling limited energy relaxation to that governed by thermal boundary resistance (phonon-phonon coupling, ph-ph) in copper films at subkelvin temperatures. Our measurement yields a quantitative picture of heat currents, in terms of temperature dependences and magnitudes, in both e-ph and pp limited regimes, respectively. We show that by adding a third layer in between the copper film and the substrate, the thermal boundary resistance is increased fourfold, consistent with an assumed series connection of thermal resistances.

KW - HEAT-CONDUCTION

KW - HOT-ELECTRONS

KW - QUANTUM

KW - MULTILAYERS

U2 - 10.1103/PhysRevApplied.12.024051

DO - 10.1103/PhysRevApplied.12.024051

M3 - Article

SN - 2331-7019

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JO - Physical Review Applied

JF - Physical Review Applied

IS - 2

M1 - 024051

ER -

Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films

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Keywords

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Projects

SQH: Superconducting quantum heat engines and refrigerators

QTF: Finnish Centre of Excellence in Quantum Technology

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OtaNano

OtaNano – Low Temperature Laboratory

OtaNano - Nanofab

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