Covering of porous silicon pores by atomic layer epitaxy

M. Utriainen, S. Lehto, M. Nieminen, L. Niinistö, C. Ducsö, N.Q. Khan, Z. Horvath, I. Barsony

    Research output: Working paperProfessional

    Original languageEnglish
    Place of PublicationHelsinki
    Pages74
    Publication statusPublished - 1996
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameThe 9th Symposium on Inorganic and Analytical Chemistry, Helsinki, 24.5.1996
    PublisherDepartment of Chemistry, University of Helsinki

    Keywords

    • ale
    • atomic layer epitaxy
    • tin oxide

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