@article{502d162060e246048d468a7b6be6a2f0,
title = "Correlating integrated circuit process induced strain and defects against device yield and process control monitoring data",
keywords = "defects, device yield, integrated circuits, silicon, defects, device yield, integrated circuits, silicon, defects, device yield, integrated circuits, silicon",
author = "M. Karilahti and T. Tuomi and R. Rantam{\"a}ki and P.J. McNally and A.N. Danilewsky",
year = "2003",
language = "English",
pages = "445--449",
journal = "Journal of Materials Science: Materials in Electronics",
issn = "1573-482X",
publisher = "Springer",
number = "14",
}