Correlating integrated circuit process induced strain and defects against device yield and process control monitoring data

M. Karilahti; T. Tuomi; R. Rantamäki; P.J. McNally; A.N. Danilewsky

Correlating integrated circuit process induced strain and defects against device yield and process control monitoring data

M. Karilahti, T. Tuomi, R. Rantamäki, P.J. McNally, A.N. Danilewsky

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

Original language	English
Title of host publication	The 4th International Conference on Materials for Microelectronics and Nanoengineering ICMMN-4, Espoo, Finland, 10-12 June, 2002
Pages	145-149
Publication status	Published - 2002
MoE publication type	A4 Article in a conference publication

Keywords

semiconductors
synchrotron x-ray topography

Cite this

@inproceedings{455e6006a65748239b82f547c4ea4745,

title = "Correlating integrated circuit process induced strain and defects against device yield and process control monitoring data",

keywords = "semiconductors, synchrotron x-ray topography, semiconductors, synchrotron x-ray topography, semiconductors, synchrotron x-ray topography",

author = "M. Karilahti and T. Tuomi and R. Rantam{\"a}ki and P.J. McNally and A.N. Danilewsky",

year = "2002",

language = "English",

pages = "145--149",

booktitle = "The 4th International Conference on Materials for Microelectronics and Nanoengineering ICMMN-4, Espoo, Finland, 10-12 June, 2002",

}

Correlating integrated circuit process induced strain and defects against device yield and process control monitoring data. / Karilahti, M.; Tuomi, T.; Rantamäki, R.; McNally, P.J.; Danilewsky, A.N.

The 4th International Conference on Materials for Microelectronics and Nanoengineering ICMMN-4, Espoo, Finland, 10-12 June, 2002. 2002. p. 145-149.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Correlating integrated circuit process induced strain and defects against device yield and process control monitoring data

AU - Karilahti, M.

AU - Tuomi, T.

AU - Rantamäki, R.

AU - McNally, P.J.

AU - Danilewsky, A.N.

PY - 2002

Y1 - 2002

KW - semiconductors

KW - synchrotron x-ray topography

KW - semiconductors

KW - synchrotron x-ray topography

KW - semiconductors

KW - synchrotron x-ray topography

M3 - Conference contribution

SP - 145

EP - 149

BT - The 4th International Conference on Materials for Microelectronics and Nanoengineering ICMMN-4, Espoo, Finland, 10-12 June, 2002

ER -