@inproceedings{455e6006a65748239b82f547c4ea4745,
title = "Correlating integrated circuit process induced strain and defects against device yield and process control monitoring data",
keywords = "semiconductors, synchrotron x-ray topography, semiconductors, synchrotron x-ray topography, semiconductors, synchrotron x-ray topography",
author = "M. Karilahti and T. Tuomi and R. Rantam{\"a}ki and P.J. McNally and A.N. Danilewsky",
year = "2002",
language = "English",
pages = "145--149",
booktitle = "The 4th International Conference on Materials for Microelectronics and Nanoengineering ICMMN-4, Espoo, Finland, 10-12 June, 2002",
}