Correction to: Ambient Condition Production of High Quality Reduced Graphene Oxide (Advanced Materials Interfaces, (1800737), 10.1002/admi.201800737)

Stanislav A. Evlashin, Sergey E. Svyakhovskiy, Fedor S. Fedorov, Yuri A. Mankelevich, Pavel V. Dyakonov, Nikita V. Minaev, Sarkis A. Dagesyan, Konstantin I. Maslakov, Roman A. Khmelnitsky, Nikolay V. Suetin, Iskander S. Akhatov, Albert G. Nasibulin

Research output: Other contributionScientific

Abstract

Adv. Mater. Interfaces. 2018, 5, 1800737 The authors regret that Figure and Figure S2 published in this manuscript was incorrect, and did not represent the data that was analyzed and discussed. The correct and complete Figures and S2 now appear here. (Figure presented.) Raman and XPS spectra of GO and rGO. a, b) Raman spectrum of GO and rGO and c, d) XPS spectrum of GO and rGO. Figure S2. a) Raman spectra for the different sets of reduction conditions. b) XPS spectra of GO and rGO. c) XPS C1s for the different sets of reduction conditions. d) FTIR spectra for different sets of reduction conditions.

Original languageEnglish
Edition19
Volume5
DOIs
Publication statusPublished - 2018

Publication series

NameAdvanced Materials Interfaces
PublisherWILEY-BLACKWELL
ISSN (Print)2196-7350

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