Controlled growth of neodymium oxide by atomic layer deposition

Anne Kosola, Jani Päiväsaari, Matti Putkonen, Lauri Niinistö

    Research output: Working paperProfessional

    Original languageEnglish
    Place of PublicationTartu, Estonia
    Pages33
    Publication statusPublished - 2002
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameThe Fifth Baltic Symposium on Atomic Layer Deposition (BALD-5), Tartu, Estonia, 24-26 October 2002
    PublisherInstitute of Physics, University of Tartu

    Keywords

    • ALD
    • neodymium oxide
    • silicon technology

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