Controlled formation of thin V_(2)O_(5) layers on silica by Atomic Layer Deposition

Jetta Keränen, Satu Ek, Eero Iiskola, A. Aroux, Lauri Niinistö

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publication2nd Int. Conference on Silica 2001, september 3-6.2001, Mulhouse France
    Publication statusPublished - 2001
    MoE publication typeA4 Article in a conference publication

    Keywords

    • ALD
    • atomic layer deposition
    • dispersion
    • silica
    • supported vanadium oxide

    Cite this