Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile

Jihong Yim, Emma Verkama, Jorge A. Velasco, Karsten Arts, Riikka L. Puurunen*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

15 Citations (Scopus)
71 Downloads (Pure)

Fingerprint

Dive into the research topics of 'Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile'. Together they form a unique fingerprint.

Engineering

Chemistry

Material Science