@article{07cb7815e95f4a958b3375fd8a4ad3f2,
title = "Composition and thickness determination of thin oxide films: Comparison of different programs and methods",
keywords = "ellipsometry, EPMA, film thickness and composition, optical spectrophotometry, profilometry, XRF, ellipsometry, EPMA, film thickness and composition, optical spectrophotometry, profilometry, XRF, ellipsometry, EPMA, film thickness and composition, optical spectrophotometry, profilometry, XRF",
author = "V. Sammelselg and J. Aarik and A. Aidla and A. Kasikov and E. Heikinheimo and M. Peussa and L. Niinist{\"o}",
year = "1999",
language = "English",
volume = "14",
pages = "523--527",
journal = "Journal of Analytical Atomic Spectrometry",
issn = "0267-9477",
publisher = "Royal Society of Chemistry",
}