Compensation in Be-doped gallium nitride grown using molecular beam epitaxy

Kyoungnae Lee*, B. Vanmil, M. Luo, T. H. Myers, A. Armstrong, S. A. Ringel, M. Rummukainen, K. Saarinen

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

2 Citations (Scopus)

Abstract

Three techniques to improve beryllium doping in Ga-polar GaN grown by molecular beam epitaxy were investigated: growth under atomic hydrogen, growth under electron irradiation, and growth under an In flux. The samples were characterized by photoluminescence and Hall effect measurements. None of these approaches led to enhanced Be activation. Optical evidence that the Be activation energy may be about 190 meV is presented. Selected samples were also characterized using positron annihilation spectroscopy in an attempt to correlate compensation and PL features with microscopic defects. Positron annihilation spectroscopy (PAS) studies suggest that gallium vacancies and/or gallium vacancy complexes may be related to compensation in beryllium doped gallium nitride samples. There is a correlation between donor-acceptor pair photoluminescence at 3.38eV, beryllium concentration, and yellow-red photoluminescence at 2.0 to 2.1 eV.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages729-734
Number of pages6
Publication statusPublished - 15 May 2006
MoE publication typeA4 Article in a conference publication
EventMaterials Research Society Fall Meeting - Boston, United States
Duration: 28 Nov 20052 Dec 2005

Conference

ConferenceMaterials Research Society Fall Meeting
Abbreviated titleMRS
CountryUnited States
CityBoston
Period28/11/200502/12/2005

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