Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Perttu Sippola^*
, Alexander Pyymaki Perros
, Oili M.E. Ylivaara
, Helena Ronkainen
, Jaakko Julin
, Xuwen Liu
, Timo Sajavaara
, Jarkko Etula
, Harri Lipsanen
, Riikka L. Puurunen

^*Corresponding author for this work

VTT Technical Research Centre of Finland
Nanovate Oy
University of Jyväskylä
Helmholtz-Zentrum Dresden-Rossendorf

Research output: Contribution to journal › Article › Scientific › peer-review

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OtaNano
Rissanen, A. (Manager)
Aalto University
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OtaNano - Nanofab
Repo, P. (Manager) & Rissanen, A. (Other)
OtaNano
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OtaNano - Nanomicroscopy Center
Seitsonen, J. (Manager) & Rissanen, A. (Other)
OtaNano
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