Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Perttu Sippola*, Alexander Pyymaki Perros, Oili M.E. Ylivaara, Helena Ronkainen, Jaakko Julin, Xuwen Liu, Timo Sajavaara, Jarkko Etula, Harri Lipsanen, Riikka L. Puurunen

*Corresponding author for this work

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