Comparison of HfO2 Thin Films Grown by ALD Using Cp2Hf(CH3)2 and Water or Ozone as Precursors

Jaakko Niinistö, Matti Putkonen, Lauri Niinistö

    Research output: Working paperProfessional

    Original languageEnglish
    Place of PublicationHelsinki
    Publication statusPublished - 2004
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameThe AVS Topical Conference on Atomic Layer Deposition (ALD 2004), Helsinki, Finland, August, 16-18, 2004
    PublisherAmerican vacuum society (AVS)

    Cite this

    Niinistö, J., Putkonen, M., & Niinistö, L. (2004). Comparison of HfO2 Thin Films Grown by ALD Using Cp2Hf(CH3)2 and Water or Ozone as Precursors. (The AVS Topical Conference on Atomic Layer Deposition (ALD 2004), Helsinki, Finland, August, 16-18, 2004).