Comparison of HfO2 Thin Films Grown by ALD Using Cp2Hf(CH3)2 and Water or Ozone as Precursors

Jaakko Niinistö, Matti Putkonen, Lauri Niinistö

    Research output: Working paperProfessional

    Original languageEnglish
    Place of PublicationHelsinki
    Publication statusPublished - 2004
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameThe AVS Topical Conference on Atomic Layer Deposition (ALD 2004), Helsinki, Finland, August, 16-18, 2004
    PublisherAmerican vacuum society (AVS)

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