Comparison of atomic layer deposition of SnO_(2) from SnI_(4) and O_(2) on different substrates

Aivar Tarre, Jenni Harjuoja, Aleks Aidla, Teet Uustare, Jaan Aarik, Arnold Rosental, Lauri Niinistö

    Research output: Working paperProfessional

    Original languageEnglish
    Place of PublicationHelsinki
    Pages152
    Publication statusPublished - 2004
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameAVS Topical Conference on Atomic Layer Deposition, Helsinki, August 16-18, 2004
    PublisherAmerican Vacuum Society

    Keywords

    • ALD
    • atomic layer deposition
    • thin films

    Cite this

    Tarre, A., Harjuoja, J., Aidla, A., Uustare, T., Aarik, J., Rosental, A., & Niinistö, L. (2004). Comparison of atomic layer deposition of SnO_(2) from SnI_(4) and O_(2) on different substrates. (pp. 152). (AVS Topical Conference on Atomic Layer Deposition, Helsinki, August 16-18, 2004).