Chemical stability of Ta diffusion barrier between Cu and Si

Chemistry

• Liquid Film 100%
• Chemical Reaction 100%
• Chemical Stability 100%
• Diffusion Barrier 100%
• Density 66%
• Procedure 33%
• Diffusion 33%
• Reaction Mechanism 33%
• Phase Diagrams 33%
• Microstructure 33%
• Scanning Electron Microscopy 33%
• X-Ray Diffraction 33%
• Rutherford Backscattering Spectroscopy 33%
• Optical Microscopy 33%

Biochemistry, Genetics and Molecular Biology

• Facilitated Diffusion 100%
• Chemical Stability 100%
• Density 66%
• Optics 33%
• X Ray Diffraction 33%
• Spectroscopy 33%

Material Science

• Defect Density 66%
• Scanning Electron Microscopy 66%
• Microscopy 66%
• Microstructure 33%
• Thin Films 33%
• X-Ray Diffraction 33%
• Metallization 33%